Microelectronics processing : inorganic materials characterization / Lawrence A. Casper, editor ; developed from a symposium sponsored by the Division of Industrial and Engineering Chemistry of the American Chemical Society
- Bib ID:
- 3919198
- Format:
- Book
- Online Version:
- Table of contents only
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- Publisher description
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- Description:
-
- Washington, DC : American Chemical Society, 1986
- x, 443 p. : ill. ; 24 cm.
- ISBN:
- 0841209340
- Series:
- ACS symposium series ; 295
- Full contents:
-
- Machine derived contents note: Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices
- Electrical Characterization of Semiconductor Materials and Devices
- Dopant Profiles by the Spreading Resistance Technique
- SEM Techniques for Characterization of Semiconductor Materials
- Semiconductor Materials Defect Diagnostics for Submicron VLSI Technology
- Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic Materials
- Applications of Auger Electron Spectroscopy in Microelectronics
- X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
- Application of Neutron Depth Profiling to Microelectronic Materials Processing
- Thermal-Wave Measurement of Thin Film Thickness
- Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
- Measurement of the Oxygen and Carbon Content of Silicon Wafers by Fourier Transform Spectrophotometry
- Application of the Raman Microprobe to Analytical Problems of Microelectronics
- Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
- Thermal-Wave Imaging in a Scanning Electron Microscope
- Fourier Transform Mass Spectrometry in the Microelectronics Service Laboratory
- Materials Characterization Using Elemental and Isotope Analysis by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
- Activation Analysis of Electronics Materials
- Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
- Characterization of Components in Plasma Phosphorus Doped Oxides
- Process Control of Vacuum-Deposited Nickel-Chromium for the Fabrication of Reproducible Thin Film Resistors
- Characterization of Spin-On Glass Films as a Planarizing Dielectric
- Effects of Various Chemistries on Silicon Wafer Cleaning
- Monitoring of Particles in Gases Using a Laser Counter
- Microelectronics Processing Problem Solving: The Synergism of Complementary Techniques.
- Notes:
- Includes bibliographies and indexes.
- Subject:
- Microelectronics -- Materials -- Congresses
- Other authors/contributors:
- Copyright:
-
In Copyright
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Copyright status was determined using the following information:
- Material type:
- Literary Dramatic Musical
- Published status:
- Published
- Publication date:
- 1986
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